주요관심분야
1. Electron/ion kinetics in low/high pressure plasma.
2. Plasma diagnostics (Cut-off probe, Langmuir probe, LIF, Thomson scattering).
3. Plasma simulation (PIC, E/M, Circuit/Global, CFD, MCC-IED)
4. Plasma source development (large area, high density, extremely low density plasma).
5. Plasma parameter/process control (IECP, Adaptive Pulsed Process, arcing)
6. Plasma fault detection and classification (FDC)
7. Plasma levitation and nano particle synthesis.
8. Ultra low pressure low density plasma source and its application.
9. Plasma processing and its mechanism (Plasma ashing, Dielectric etch, HARC etch, wafer bonding, ALE, PECVD)
10. Plasma sensor development and optimization (V-I probe, TUSI probe, MOLE probe, Cutoff probe, VIP, QMS, Virtual IED sensor)
